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Engineering Physics

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MODELING AND ANALYSIS OF THE SURFACE OF THIN FILM MATERIALS
V.А. VASIL'EV, P.S. CHERNOV

A short review of existing approaches and models is given. An original model of thin films surface growth is proposed representing stochastic cellular automata and allowing investigation of influence of wafer temperature, deposition rate and time on the morphology parameters of a surface. Comparison simulation results with atomic-force microscopy of experimentally received thin films samples are giv-en. Key words: surface growth, thin films, stochastic cellular automata, morphology parameters.

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