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Engineering Physics Annotation << Back
INVESTIGATION OF THE STRUCTURE AND PROPERTIES OF SIOX FILMS SYNTHESIZED BY CHEMICAL ETCHING OF AMORPHOUS ALLOY BANDS |
V.A. FEDOROV, A.D. BEREZNER, A.I. BESKROVNYY, T.N. FURSOVA, A.V. PAVLIKOV, A.V. BAZHENOV
The present paper contains investigations of the structure and physical properties of amorphous SiOx fi lms synthesized by the chemical etching of the amorphous Fe-based alloy bands. Neutron diff raction, atomic-force microscopy and electronic microscopy prove that the synthesized visibly transparent fi lms have the amorphous structure, similar to the morphology of the annealed films and possessing dielectric properties. By using the methods of diff erential scanning calorimetry, Raman spectroscopy and infrared spectroscopy there was performed the assessment of the order in the structure of the samples prior to and after their thermal treatment. It was established that the annealing of the fi lms in the air medium at the temperature of 1273° K results in the changing of the fi lms’ chemical composition towards the SiOx compound, with inclusions of the cristobalite phase.
Key words: amorphous SiOx fi lms, structure and physical properties, neutron diff raction, atomic-force microscopy, electronic microscopy, Raman spectroscopy and infrared spectroscopy, cristobalite phase.
DOI: 10.25791/infizik.01.2019.387
Contacts: E-mail: fedorov@tsu.tmb.ru
Pp. 03-10. |
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