Engineering Physics Annotation << Back RF POWER ABSORPTION BY PLASMA OF LOW PRESSURE INDUCTIVE DISCHARGE A.F. ALEXANDROV, E.A. KRALKINA, P.A. NEKLIUDOVA, V.B. PAVLOV, A.K. PETROV, A.A. RUKHADZE, K.V. VAVILIN Present paper is aimed to analyze the power absorption mechanism and to reveal both experimentally and numerically the basic factors determining the ability of plasma to absorb the RF power characterized by the equivalent plasma resistance value under different conditions of low pressure RF inductive discharge sustaining, i.e. different antenna shape, pressure, electron density, operating frequency and geometrical size of plasma sources. Experimental and numerical results show the non-monotonous variation of equivalent plasma resistance with increase of electron density, its growth with neutral gas pressure and shift of equivalent plasma resistance maximum towards higher electron densities with the rise of operating frequency. Keywords: plasma, inductive discharge, power absorption, low pressure, plasma resistance. Contacts: E-mail: ekralkina@mail.ru, E-mail: vb_pavlov@mail.ru Pp. 53-65.